PL-360LP Photolithography Mask Aligner Filter 215x215mm
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| Description | The PL-360LP mask aligner filter for photolithography offers improved exposures, and sharper, straighter feature walls of the SU-8 photoresist. With a nominal cut-on wavelength of 360nm, blocking shorter wavelengths and transmitting the longer wavelengths including the useful 365, 405 & 436nm mercury lines. |
Short Description | The PL-360LP mask aligner filter for photolithography offers improved exposures, and sharper, straighter feature walls of the SU-8 photoresist. With a nominal cut-on wavelength of 360nm, blocking shorter wavelengths and transmitting the longer wavelengths including the useful 365, 405 & 436nm mercury lines. |
|---|---|---|---|
| Transmitted Wavefront Distortion | Cut-on Wavelength Tolerance | +7/-7 |
|
| Cut-on Wavelength (nm) | 365 |
Angle of Incidence | |
| Search Size | 215.9 |
Search Cut-on | 365 |
| Minimum Surface Quality | Product Type | ||
| Inventory Type | Width Tolerance | +1/-1 |
|
| Width (mm) | 215.9 |
Physical Thickness | 2 |
| Shape | Parallelism | ||
| Length (mm) | 215.9 |
Flatness | |
| Coating Type | Fluorescence Component | ||
| Filter Type | Filter Application | ||
| Filters & Dichroics Type |